Titanium silicide etching in sub-half-micron device technology
- 著者名:
- Chooi,S.Y.M. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Sih,V.K.T. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Siah,S.-Y. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Ismail,Z. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Zhou,M.-S ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- 掲載資料名:
- Multilevel Interconnect Technology II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3508
- 発行年:
- 1998
- 開始ページ:
- 191
- 終了ページ:
- 201
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429674 [0819429678]
- 言語:
- 英語
- 請求記号:
- P63600/3508
- 資料種別:
- 国際会議録
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