Characterization of pattern density and the metal stack composition on chlorine residues from the metal etch process
- 著者名:
- Loong,S.Y. ( National Univ.of Singapore and Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Lee,H.K. ( National Univ.of Singapore )
- Zhou,M.S. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Chan,L.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Premachandran,V. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- 掲載資料名:
- Multilevel Interconnect Technology II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3508
- 発行年:
- 1998
- 開始ページ:
- 170
- 終了ページ:
- 180
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429674 [0819429678]
- 言語:
- 英語
- 請求記号:
- P63600/3508
- 資料種別:
- 国際会議録
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