Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering-bar optical proximity correction
- 著者名:
- Adam,K. ( Univ.of California/Berkeley )
- Socha,R.J.
- Dusa,M.V.
- Neureuther,A.R.
- 掲載資料名:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3546
- 発行年:
- 1998
- 開始ページ:
- 642
- 終了ページ:
- 650
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- 言語:
- 英語
- 請求記号:
- P63600/3546
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |