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Inductively coupled plasma etch of DUV MoSi photomasks:a designed study of etch chemistries and process results

著者名:
掲載資料名:
18th Annual BACUS Symposium on Photomask Technology and Management
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3546
発行年:
1998
開始ページ:
88
終了ページ:
97
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819430076 [0819430072]
言語:
英語
請求記号:
P63600/3546
資料種別:
国際会議録

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