Blank Cover Image

Structure of polycrystalline silicon films by glow-discharge decomposition using SiH4/H2/SiF4 at low temperature

著者名:
掲載資料名:
Nanophase and nanocomposite materials III : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
581
発行年:
2000
開始ページ:
199
出版情報:
Pittsburgh, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558994898 [1558994890]
言語:
英語
請求記号:
M23500/581
資料種別:
国際会議録

類似資料:

1 国際会議録 Optical properties of nanocrystalline silicon films with different deposition temperatures

Ali, A. M., Inokuma, T., Kurata, Y., Hasegawa, S.

MRS-Materials Research Society
7 国際会議録 Linear and nonlinear optical properties of silicon micro- and nanocrystallites

Milovzorov,D., Inokuma,T., Kurata,Y., Hasegawa,S., Suzuki,T.

SPIE - The International Society for Optical Engineering
2 国際会議録 Deposition of SiO2:F:C films with low dielectric constant and with high resistance to annealing

Lubguban, J., Kurata, Y., Inokuma, T., Hasegawa, S.

MRS-Materials Research Society
8 国際会議録 a-Si AND μc-Si GROWN FROM SiF4 WITH HIGH H2 DULUTION IN A DC GLOW DISCHARGE

Okada, Y., Chen, J., Campbell, I. H., Fauchet, P. M., Wagner, S.

Materials Research Society
3 国際会議録 Bonding Configuration and Defects in Glow-Discharge Amorphous SiNx:H Films Deposited at 300°C and 500°C

Hasegawa,S., Amano,Y., He,L., Inokuma,T., Kurata,Y.

Trans Tech Publications
9 国際会議録 "Structure and properties of a-Si : H : F films obtained by R. F. glow-discharge in SiH4-F2 mixtures"

ALMEIDA R. M., DIAS A. G.

Martinus Nijhoff Publishers
4 国際会議録 Effects of CF4 addition on the growth of amorphous CNx films by plasma decomposition of CH4-N2 gas mixtures

Inokuma, T., Matsumoto, H., Kurita, Y., Hasegawa, S.

MRS-Materials Research Society
10 国際会議録 LIGHT-SOAKING OF a-Si:H,F FILMS DEPOSITED FROM SiF4 AND H2

Parl. H. R., Liu, J. Z., Maruyama, A., Wagner, S.

Materials Research Society
5 国際会議録 Low Temperature Growth of Nanocrystalline Silicon from SiF4 + SiH4

Chen, Yu, Taguchi, M., Wagner, S.

MRS - Materials Research Society
11 国際会議録 Structural Characterization of SiF4, SiH4 and H2 Hot-Wire-Grown Microcrystalline Silicon Thin Films With Large Grains

Gutierrez, J.J., Inglefield, C.E., An, C.P., DeLong, M.C., Taylor, P.C., Morrison, S., Madan, A.

Materials Research Society
6 国際会議録 Fluorinated Silicon Nitride Film Deposited at Low Temperatures from SiH4-SiF4-NH3

Park, Y-B., Rhee, S., Choi, J-H., Kim, C-W., Suok, J. H.

MRS - Materials Research Society
12 国際会議録 MATERIAL CHARACTERIZATION OF LOW-TEMPERATURE SILICON EPITAXIAL GROWTH ON PATTERNED OXIDIZED WAFERS BY ULPCVD FROM SiH4/SiF4/H2

Yew, Tri-Rung, Reif, Rafael

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12