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Room temperature deposition of silicon oxynitride films with low stress using sputtering-type electron cyclotron resonance plasmas

著者名:
Gao, D.
Furukawa, K.
Nakashima, H.
Gao, J.
Wang, J.
Muraoka, K.
さらに 1 件
掲載資料名:
Thin films - stresses and mechanical properties VIII : symposium held November 29-December 3, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
594
発行年:
2000
開始ページ:
457
出版情報:
Warrendale, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995024 [1558995021]
言語:
英語
請求記号:
M23500/594
資料種別:
国際会議録

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