Room temperature deposition of silicon oxynitride films with low stress using sputtering-type electron cyclotron resonance plasmas
- 著者名:
Gao, D. Furukawa, K. Nakashima, H. Gao, J. Wang, J. Muraoka, K. - 掲載資料名:
- Thin films - stresses and mechanical properties VIII : symposium held November 29-December 3, 1999, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 594
- 発行年:
- 2000
- 開始ページ:
- 457
- 出版情報:
- Warrendale, Pa.: MRS-Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995024 [1558995021]
- 言語:
- 英語
- 請求記号:
- M23500/594
- 資料種別:
- 国際会議録
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SILICON NITRIDE DEPOSITED AT VERY LOW SILANE PRESSURES USING ELECTRON CYCLOTRON RESONANCE PLASMAS
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