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Methylamine growth of SiCN films using ECR-CVD

著者名:
Wen, C-Y.
Wu, J-J.
Lo, H. J.
Chen, L. C.
Chen, K. H.
Lin, S. T.
Yu, Y-C.
Wang, C-W.
Lin, E-K.
さらに 4 件
掲載資料名:
Chemical processing of dielectrics, insulators and electronic ceramics : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
606
発行年:
2000
開始ページ:
115
出版情報:
Warrendale: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995147 [1558995145]
言語:
英語
請求記号:
M23500/606
資料種別:
国際会議録

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