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Line-Width Dependence of Void Formation in Ti-Salicided BF2-Doped Polysilicon Lines

著者名:
掲載資料名:
Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
564
発行年:
1999
開始ページ:
91
出版情報:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994713 [1558994718]
言語:
英語
請求記号:
M23500/564
資料種別:
国際会議録

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