Disorder and Strain Effects in the Optical Response of Thin CoSi Epitaxial Films on Si(111)

Disorder and Strain Effects in the Optical Response of Thin CoSi Epitaxial Films on Si(111)

著者名:

Bocelli, S.

掲載資料名:

Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

402

発行年:

1996

開始ページ:

631

出版情報:

Pittsburgh: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993051 [1558993053]

言語:

英語

請求記号:

M23500/402

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019834
シリーズID:	PA00000011
会議名:	Symposium on silicide thin films
回次:	1995
会議開催地:	Boston, MA, USA
会議開催年:	1995.11.27-1995.11.30

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4 国際会議録 New Epitaxially Stabilized Silicide Phases Goncalves-Conto, S., Muller, E., Schmidt, K., Kanel, H. von MRS - Materials Research Society	10 国際会議録 PHONON SPECTRA DEPENDENCE ON GROWTH AND SAMPLE TREATMENT IN β-FeSi2 Guizzetti, G., Marabelli, F., Patrini, M., Mo, Y., Onda, N., Kanel, H. von MRS - Materials Research Society
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