Manufacturability Issues for Application of Silicides in 0.25 ヲフm CMOS Process and Beyond
- 著者名:
Wang, Q. F. Lauwers, A. Jonckx, F. Potter, M. de Chen, Chun-Cho Maex, K. - 掲載資料名:
- Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 402
- 発行年:
- 1996
- 開始ページ:
- 221
- 出版情報:
- Pittsburgh: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993051 [1558993053]
- 言語:
- 英語
- 請求記号:
- M23500/402
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |