PRODUCING AND CONTROLLING SUBSTRATE TEMPERATURE UNIFORMITY FROM 600｡？TO 1100｡？IN CVD ROTATING DISK REACTORS

PRODUCING AND CONTROLLING SUBSTRATE TEMPERATURE UNIFORMITY FROM 600｡？TO 1100｡？IN CVD ROTATING DISK REACTORS

著者名:

Gurary, A. I.

掲載資料名:

Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

363

発行年:

1995

開始ページ:

101

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992641 [1558992642]

言語:

英語

請求記号:

M23500/363

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019831
シリーズID:	PA00000011
会議名:	Symposium on chemical vapor deposition of refractory metals and ceramics
回次:	3rd
会議開催地:	Boston, MA, USA
会議開催年:	1994.11.28-1994.11.30

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