Formation of oxygen-related donors during transition from thermal donors to new donors in CZ-silicon

Formation of oxygen-related donors during transition from thermal donors to new donors in CZ-silicon

著者名:

Singh,S. ( G.B.Pant Univ.of Agriculture and Technology )
Prakash,O.

掲載資料名:

Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing III

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2877

発行年:

1996

開始ページ:

70

終了ページ:

78

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422750 [0819422754]

言語:

英語

請求記号:

P63600/2877

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019809
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing
回次:	1996 : 3rd
会議開催地:	Austin, TX, USA
会議開催年:	1996.10.16-1996.10.17

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2 国際会議録 Effect of oxygen and carbon on donor formation in CZ-silicon S. Singh Society of Photo-optical Instrumentation Engineers	8 国際会議録 EARLY STAGE OF THE NEW DONORS FORMATION IN CZ-SILICON. VENDANGE,P., HENRY,A., SAMINADAYAR,K., MAGNEA,N., PAUTRAT,J.L. Trans Tech Publications
3 国際会議録 ON THE QUESTION OF OXYGEN DIFFUSION DURING OXYGEN RELATED THERMAL DONOR FORMATION IN SILICON Oehrlein, G.S., Tan, T.Y., Kleinhenz, R.L., Lindstrom, J.L. Materials Research Society	9 国際会議録 MEASUREMENTS OF ENHANCED OXYGEN DIFFUSION IN SILICON DURING THERMAL DONOR FORMATION: NEW EVIDENCE FOR POSSIBLE MECHANISMS Brown, A.R., Murray, R., Newman, R.C., Tucker, J.H. Materials Research Society
4 国際会議録 TD formation in CZ-silicon annealed at 450｡？in air ambient Singh,S., Prakash,O., Pant,G.B. SPIE-The International Society for Optical Engineering	10 国際会議録 SELECTIVE HYDROGEN PASSIVATION OF OXYGEN-RELATED THERMAL-DONOR CLUSTERS IN SILICON. JOHNSON,N.M., HAHN,S.K., STEIN,H.J. Trans Tech Publications
5 国際会議録 Analysis of Oxygen Thermal Donor Formation in n-type Cz-Silicon Rafi, J.M., Simoen, E., Claeys, C., Ulyashin, A., Job, R., Fahrner, W., Versluys, J., Clauws, P., Lozano, M., … SPIE-The International Society for Optical Engineering	11 国際会議録 FORMATION OF A LOW THERMAL DONORS CONCENTRATION LAYEER IN Cz Si WAFER DURING 450 C/64hr ANNEALING Hahn, S. Materials Research Society
6 国際会議録 Analysis of Oxygen Thermal Donor Formation in n-type Cz-Silicon Raft, J.M., Simoen, E., Claeys, C., Ulyashin, A., Job, R., Fahrner, W., Versluys, J., Clauws, P., Lozano, M, Campabadal, … Electrochemical Society	12 国際会議録 ENHANCED OXYGEN DIFFUSION IN SILICON AT THERMAL DONOR FORMATION TEMPERATURE. LEE,S.-T., FFLLINGER,P. Trans Tech Publications

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