High-accuracy critical-dimension metrology using a scanning electron microscope

High-accuracy critical-dimension metrology using a scanning electron microscope

著者名:

Lowney,J.R. ( National Institute of Standards and Technology )
Vladar,A.E.
Postek,M.T.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2725

発行年:

1996

開始ページ:

515

終了ページ:

526

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421012 [0819421014]

言語:

英語

請求記号:

P63600/2725

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019794
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithography
回次:	1996 : 10th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.11-1996.03.13

類似資料:

1 国際会議録 Scanning electron microscope analog of scatterometry Villarrubia, J.S., Vladar, A.E., Lowney, J.R., Postek, M.T., Jr. SPIE-The International Society for Optical Engineering	7 国際会議録 Potentials for high pressure/environmental SEM microscopy for photomask dimensional metrology Postek, M.T., Vladar, A.E., Rice, T.M., Knowles, R. SPIE-The International Society for Optical Engineering
2 国際会議録 Fourier transform feedback tool for scanning electron microscopes used in semiconductor metrology Postek,M.T., Vladar,A.E., Davidson,M.P. SPIE-The International Society for Optical Engineering	8 国際会議録 Reference Material 8091: new scanning electron microscope sharpness standard Vladar,A.E., Postek,M.T., Zhang,N.-F., Larrabee,R.D., Jones,S.N., Hajdaj,R.E. SPIE-The International Society for Optical Engineering
3 国際会議録 Is a production-level scanning electron microscope linewidth standard possible? Postek,M.T., Vladar,A.E., Villarrubia,J.S. SPIE - The International Society for Optical Engineering	9 国際会議録 Linewidth measurement intercomparison on a BESOI sample Villarrubia,J.S., Vladar,A.E., Lowney,J.R., Postek,M.T., Allen,R.A., Cresswell,M.W., Ghoshtagore,R.N. SPIE - The International Society for Optical Engineering
4 国際会議録 Potentials of online scanning electron microscope performance analysis using NIST reference material 8091 Postek,M.T., Vladar,A.E., Zhang,N.-F., Larrabee,R.D. SPIE - The International Society for Optical Engineering	10 国際会議録 Active monitoring and control of electron-beam-induced contamination Vladar,A.E., Postek,M.T., Vane,R. SPIE-The International Society for Optical Engineering
5 国際会議録 Edge determination for polycrystalline silicon lines on gate oxide Villarrubia,J.S., Vladar,A.E., Lowney,J.R., Postek Jr.,M.T. SPIE-The International Society for Optical Engineering	11 国際会議録 New way of handling dimensional measurement results for integrated circuit technology Vladar, A.E., Villarrubia, J.S., Postek, M.T. SPIE-The International Society for Optical Engineering
6 国際会議録 Potentials for inspection and metrology of MEMS using a combined scanning electron microscope (SEM) and proximal probe microscope (PPM) (Invited Paper) Postek,M.T. SPIE-The International Society for Optical Engineering	12 国際会議録 SEM performance evaluation using the sharpness criterion Postek,M.T., Vladar,A.E. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12