Sputter Deposition of Thin Films for High Mobility Poly-Si TFT Fabrication
- 著者名:
- Serikawa,T.
- 掲載資料名:
- Plasma properties, deposition and etching
- シリーズ名:
- Materials science forum
- シリーズ巻号:
- 140-142
- 発行年:
- 1993
- 開始ページ:
- 387
- 終了ページ:
- 404
- 出版情報:
- Aedermannsdorf, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- ISBN:
- 9780878496709 [087849670X]
- 言語:
- 英語
- 請求記号:
- M23650
- 資料種別:
- 国際会議録
類似資料:
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STRUCTURAL CHARACTERIZATION OF LASER-ANNEALED SPUTTERED POLY-Si FILMS FOR HIGH MOBILITY TFTS
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HIGH RATE DEPOSITION OF NICKEL OXIDE ELECTROCHROMIC THIN FILMS BY REACTIVE DC MAGNETRON SPUTTERING
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