Optimization of LPCVD silicon oxynitride growth to large refractive index homogeneity and layer thickness uniformity

Optimization of LPCVD silicon oxynitride growth to large refractive index homogeneity and layer thickness uniformity

著者名:

Worhoff,K. ( Univ.Twente(Netherlands) )

Lambeck,P.V. ( Univ.Twente(Netherlands) )

Albers,H. ( Univ.Twente(Netherlands) )

Noordman,O.F.J. ( Univ.Twente(Netherlands) )

van Hulst,N.F. ( Univ.Twente(Netherlands) )

Popma,Th.J.A. ( Univ.Twente(Netherlands) )

さらに 1 件

掲載資料名:

Micro-optical technologies for measurement, sensors, and microsystems II and Optical fiber sensor technologies and applications : 18-20 June 1997, Munich, FRG

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3099

発行年:

1997

巻:

Part 1

開始ページ:

257

終了ページ:

268

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425195 [0819425192]

言語:

英語

請求記号:

P63600/3099

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019730
シリーズID:	PA00000029
会議名:	Lasers, Optics, and Vision for Productivity in Manufacturing : Micro-optical Technologies for Measurement, Sensors, and Microsystems
回次:	1997 : 2nd
会議開催地:	Munich, FRG
会議開催年:	1997.06.18-1997.06.20

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