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Contact potential difference methods for full wafer characterization of Si/Si02 interface defects induced by plasma processing (Invited Paper)

著者名:
Edelman,P. ( Semiconductor Diagnostics,Inc. )
Savchouk,A. ( Semiconductor Diagnostics,Inc. )
Wilson,M. ( Semiconductor Diagnostics,Inc. )
Jastrzebski,L. ( Semiconductor Diagnostics,Inc. )
Lagowski,J.J. ( Semiconductor Diagnostics,Inc. )
Nauka,K. ( Hewlett-Packard Labs. )
Ma,S. ( Hewlett-Packard Labs. )
Hoff,A.M. ( Univ.of South Florida )
DeBusk,D.K. ( Cirent Semiconductor,Inc. )
さらに 4 件
掲載資料名:
In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3509
発行年:
1998
開始ページ:
126
終了ページ:
136
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780081942963 [0081942968]
言語:
英語
請求記号:
P63600/3509
資料種別:
国際会議録

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