Ion Beam Synthesis of Buried Ion Disilicide
- 著者名:
- 掲載資料名:
- Crucial issues in semiconductor materials and processing technologies
- シリーズ名:
- NATO ASI series. Series E, Applied sciences
- シリーズ巻号:
- 222
- 発行年:
- 1992
- 開始ページ:
- 363
- 終了ページ:
- 368
- 総ページ数:
- 6
- 出版情報:
- Dordrecht: Kluwer Academic Publishers
- ISSN:
- 0168132X
- ISBN:
- 9780792320036 [0792320034]
- 言語:
- 英語
- 請求記号:
- N11482/222
- 資料種別:
- 国際会議録
類似資料:
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3
国際会議録
THICKNESS DEPENDENCE OF ELECTRICAL TRANSPORT IN BURIED CoSi2 FILMS FABRICATED BY ION BEAM SYNTHESIS
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4
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CoSi2 PRECIPITATE COARSENING DURING FORMATION OF BURIED EPITAXIAL CoSi2 LAYERS BY ION BEAM SYNTHESIS
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