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New method to design halftone mask for the fabrication of continuous microrelief structure

著者名:
Su,J. ( Sichuan Univ. )
Du,J.
Yao,J.
Gao,F.
Guo,Y.
Cui,Z.
さらに 1 件
掲載資料名:
Design, test, and microfabrication of MEMS and MOEMS : 30 March-1 April 1999, Paris, France
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3680
発行年:
1999
巻:
Part2
開始ページ:
879
終了ページ:
886
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431547 [0819431540]
言語:
英語
請求記号:
P63600/3680
資料種別:
国際会議録

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