Results from submicron CD metrology obtained with new I-line tools

Results from submicron CD metrology obtained with new I-line tools

著者名:

Bruck,H.-J. ( MueTec GmbH )

掲載資料名:

15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3665

発行年:

1999

開始ページ:

76

終了ページ:

86

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431394 [0819431397]

言語:

英語

請求記号:

P63600/3665

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019463
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technolong for Integrated Circuits and Microcomponents
回次:	1998 : 15th
会議開催地:	Munich-Unterhaching, Germany
会議開催年:	1998.11.16-1998.11.17

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