Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography

Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography

著者名:

Ham,Y.-M. ( Hyundai Electronics lndustries Co.,Ltd. )

掲載資料名:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4000

発行年:

2000

巻:

Part2

開始ページ:

1053

終了ページ:

1061

出版情報:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

言語:

英語

請求記号:

P63600/4000

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019438
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2000 : 13th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.03.01-2000.03.03

類似資料:

1 国際会議録 Reduction of isolated-dense bias by optimization off-axis illumination for 150-nm lithography using KrF Kim,S.-K., Ahn,C.-N., Kim,S.-M., Ham,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering	7 国際会議録 Validation of repair process for DUV attenuated phase-shift mask Paek,S.W., Kim,H.-B., Ahn,C.-N., Koo,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering
2 国際会議録 Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography Ham,Y.-M., Kim,S.-M., Kim,S.-J., Bae,S.-M., Kim,Y.-D., Baik,K.-H. SPIE-The International Society for Optical Engineering	8 国際会議録 Optimization of alignment key in electron-beam lithography Kim,C.-K., Hur,C., Kim,Y.-S., Baik,K.-H. SPIE - The International Society for Optical Engineering
3 国際会議録 Feasibility studies of ArF Lithography for sub-130-nm lithography Lee,S.-H., Yim,D., Ham,Y.-M., Baik,K.-H., Choi,I.H. SPIE - The International Society for Optical Engineering	9 国際会議録 Accuracy of diffused aerial image model for full-chip-level optical proximity correction Hong,J.-S., Kim,H.-B., Yune,H.-S., Ahn,C.-N., Koo,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering
4 国際会議録 Comparison study for sub-150-nm DUV lithography between high-NA KrF and ArF lithography Yim,D., Kwon,K.-S., Ham,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering	10 国際会議録 Printing 95-nm DRAM full chip patterns in KrF lithography Kim, S.-K., Kim, J.-S., Yoo, T.-J., Kong, K.-K., Yun, H.-S., Kim, Y.-D., Kim, H.-R., Kim, Y.-S., Kim, H.S. SPIE-The International Society for Optical Engineering
5 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	11 国際会議録 Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography Kim,S.-K., Kim,Y.-S., Kim,J.-S., Bok,C.-K., Ham,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering
6 国際会議録 Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography Yune,H.-S., Kim,H.-B., Kim,W.-H., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering	12 国際会議録 TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12