Optical proximity correction considering mask manufacturability and its application to 0.25-ヲフm DRAM for enhanced device performance
- 著者名:
Park,C.-H. ( Samsung Electronics Co.,Ltd. ) Rhie,S.-U. Choi,J.-H. Park,J.-S. Seo,H.-W. Kim,Y.-H. Park,Y.-K. Han,W.-S. Lee,W.-S. Kong,J.-T. - 掲載資料名:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4000
- 発行年:
- 2000
- 巻:
- Part2
- 開始ページ:
- 1041
- 終了ページ:
- 1046
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- 言語:
- 英語
- 請求記号:
- P63600/4000
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
7
国際会議録
Optical proximity effects correction at 0.25ヲフm incorporating process variations in lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |