Validation of repair process for DUV attenuated phase-shift mask
- 著者名:
- Paek,S.W. ( Hyundai Electronics Industries Co.,Ltd. )
- Kim,H.-B.
- Ahn,C.-N.
- Koo,Y.-M.
- Baik,K.-H.
- 掲載資料名:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4000
- 発行年:
- 2000
- 巻:
- Part1
- 開始ページ:
- 612
- 終了ページ:
- 620
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- 言語:
- 英語
- 請求記号:
- P63600/4000
- 資料種別:
- 国際会議録
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