Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography

Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography

著者名:

Kim,S.-K. ( Hyundai Electronics Industries Co.,Ltd. )

掲載資料名:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4000

発行年:

2000

巻:

Part1

開始ページ:

435

終了ページ:

442

出版情報:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

言語:

英語

請求記号:

P63600/4000

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019438
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2000 : 13th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.03.01-2000.03.03

類似資料:

1 国際会議録 Aberration effects in the region of 0.18-ｦﾌm lithography with KrF excimer stepper Yim,D., Lim,C.-M., Kim,H.-S., Baik,K.-H. SPIE-The International Society for Optical Engineering	7 国際会議録 Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography Hsia,C.-C., Gau,T.-S., Yang,C.-H., Liu,R.-C., Chang,C.-H., Chen,L.-J., Wang,C.-M., Chen,J.F., Smith,B.W., Hwang,G.-W., … SPIE - The International Society for Optical Engineering
2 国際会議録 Comparison study for sub-150-nm DUV lithography between high-NA KrF and ArF lithography Yim,D., Kwon,K.-S., Ham,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering	8 国際会議録 ArF step-and-scan exposure system for 0.15-ｦﾌm and 0.13-ｦﾌm technology nodes Mulkens,J., Stoeldraijer,J.M., Davies,G., Dierichs,M., Heskamp,B., Moers,M.H., George,R.A., Roempp,O., Glatzel,H., … SPIE - The International Society for Optical Engineering
3 国際会議録 Practical implementation of top-surface imaging process by silylation to sub-0.20-ｦﾌm lithography Park,B.J., Baik,K.H., Kim,H.K., Kim,J.W., Bok,C.K., Vertommen,J., Rosenlund,R. SPIE-The International Society for Optical Engineering	9 国際会議録 Comparison study on mask error factor in 100-nm ArF and KrF lithography Eom,T.-S., Hyun,Y.-S., Kim,C.-K., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering
4 国際会議録 Challenge to 0.13-ｦﾌm device patterning using KrF Kim,I.-S., Lee,J.-H., Cha,D.-H., Park,J.-S., Cho,H.-K., Moon,J.-T. SPIE - The International Society for Optical Engineering	10 国際会議録 Feasibility studies of ArF Lithography for sub-130-nm lithography Lee,S.-H., Yim,D., Ham,Y.-M., Baik,K.-H., Choi,I.H. SPIE - The International Society for Optical Engineering
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6 国際会議録 Intrafield critical dimension variation using KrF scanner system for 0.18-ｦﾌm lithography Yim,D., Kim,H.-S., Baik,K.-H. SPIE-The International Society for Optical Engineering	12 国際会議録 Practical implementation of alternating PSM to memory device of sub-0.25-ｦﾌm technology Ahn,C.-N., Kim,H.-E., Kim,H.-B., Baik,K.-H. SPIE-The International Society for Optical Engineering

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