Blank Cover Image

Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography

著者名:
Kim,S.-K. ( Hyundai Electronics Industries Co.,Ltd. )
Kim,Y.-S.
Kim,J.-S.
Bok,C.-K.
Ham,Y.-M.
Baik,K.-H.
さらに 1 件
掲載資料名:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4000
発行年:
2000
巻:
Part1
開始ページ:
435
終了ページ:
442
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
言語:
英語
請求記号:
P63600/4000
資料種別:
国際会議録

類似資料:

1 国際会議録 Aberration effects in the region of 0.18-ｦﾌm lithography with KrF excimer stepper

Yim,D., Lim,C.-M., Kim,H.-S., Baik,K.-H.

SPIE-The International Society for Optical Engineering
7 国際会議録 Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography

Hsia,C.-C., Gau,T.-S., Yang,C.-H., Liu,R.-C., Chang,C.-H., Chen,L.-J., Wang,C.-M., Chen,J.F., Smith,B.W., Hwang,G.-W., …

SPIE - The International Society for Optical Engineering
2 国際会議録 Comparison study for sub-150-nm DUV lithography between high-NA KrF and ArF lithography

Yim,D., Kwon,K.-S., Ham,Y.-M., Baik,K.-H.

SPIE - The International Society for Optical Engineering
8 国際会議録 ArF step-and-scan exposure system for 0.15-ｦﾌm and 0.13-ｦﾌm technology nodes

Mulkens,J., Stoeldraijer,J.M., Davies,G., Dierichs,M., Heskamp,B., Moers,M.H., George,R.A., Roempp,O., Glatzel,H., …

SPIE - The International Society for Optical Engineering
3 国際会議録 Practical implementation of top-surface imaging process by silylation to sub-0.20-ｦﾌm lithography

Park,B.J., Baik,K.H., Kim,H.K., Kim,J.W., Bok,C.K., Vertommen,J., Rosenlund,R.

SPIE-The International Society for Optical Engineering
9 国際会議録 Comparison study on mask error factor in 100-nm ArF and KrF lithography

Eom,T.-S., Hyun,Y.-S., Kim,C.-K., Bok,C.-K., Shin,K.-S.

SPIE-The International Society for Optical Engineering
4 国際会議録 Challenge to 0.13-ｦﾌm device patterning using KrF

Kim,I.-S., Lee,J.-H., Cha,D.-H., Park,J.-S., Cho,H.-K., Moon,J.-T.

SPIE - The International Society for Optical Engineering
10 国際会議録 Feasibility studies of ArF Lithography for sub-130-nm lithography

Lee,S.-H., Yim,D., Ham,Y.-M., Baik,K.-H., Choi,I.H.

SPIE - The International Society for Optical Engineering
5 国際会議録 Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography

Ham,Y.-M., Kim,S.-M., Kim,S.-J., Bae,S.-M., Kim,Y.-D., Baik,K.-H.

SPIE-The International Society for Optical Engineering
11 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., …

SPIE-The International Society for Optical Engineering
6 国際会議録 Intrafield critical dimension variation using KrF scanner system for 0.18-ｦﾌm lithography

Yim,D., Kim,H.-S., Baik,K.-H.

SPIE-The International Society for Optical Engineering
12 国際会議録 Practical implementation of alternating PSM to memory device of sub-0.25-ｦﾌm technology

Ahn,C.-N., Kim,H.-E., Kim,H.-B., Baik,K.-H.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12