Blank Cover Image

In-situ measurement of lens aberrations

著者名:
掲載資料名:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4000
発行年:
2000
巻:
Part1
開始ページ:
18
終了ページ:
29
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
言語:
英語
請求記号:
P63600/4000
資料種別:
国際会議録

類似資料:

1 国際会議録 Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth

Lalovic,I., Kroyan,A., Farrar,N.R., Taitano,D., Zambon,P., Smith,A.H.

SPIE-The International Society for Optical Engineering
7 国際会議録 Lens aberration measurement and analysis using a novel pattern

Nam,B.H., Cho,B.H., Park,J.O., Kim,D.-S., Baek,S.J., Jeong,J.H., Nam,B.-S., Hwang,Y.J., Song,Y.J.

SPIE-The International Society for Optical Engineering
2 国際会議録 Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application

Seong,N., Yeo,G., Cho,H., Moon,J.

SPIE - The International Society for Optical Engineering
8 国際会議録 Lens aberration measurement technique using attentuated phase-shifting mask

Imai,A., Hayano,K., Fukuda,H., Asai,N., Hasegawa,N.

SPIE - The International Society for Optical Engineering
3 国際会議録 Effect of off-axis illumination on stepper overlay

N.R. Farrar

Society of Photo-optical Instrumentation Engineers
9 国際会議録 Comparisons of critical parameters for high- and low-activation-energy deep-UV photoresists

Conley,W., Babcock,C.P., Farrar,N.R., Liu,H.-Y., Peterson,B., Taira,K.

SPIE-The International Society for Optical Engineering
4 国際会議録 Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners

Terry,M., Lalovic,I., Wells,G.M., Smith,A.H.

SPIE-The International Society for Optical Engineering
10 国際会議録 Fluorescence imaging and velocimetry of laminar separation at a fin-body junction in a hypersonic flow

Houwing,F.P., Smith,D.R., Fox,J.S., Danehy,P.M., Mudford,N.R.

SPIE-The International Society for Optical Engineering
5 国際会議録 Effects of 95% integral vs. FWHM bandwidth specifications on lithographic imaging

Kroyan,A., Lalovic,I., Farrar,N.R.

SPIE-The International Society for Optical Engineering
11 国際会議録 Photolithography process characterization and 3D simulation using track-mounted development rate monitor data

S. Dutta Chowdhury, D. Alexander, M. Goldman, A.W. Kukas, N.R. Farrar

Society of Photo-optical Instrumentation Engineers
6 国際会議録 Measurements of dynamic pointing variations of a large radio telescope

Smith,D.R., Paglione,T.A.D., Lovell,A.J., Ukita,N., Matsuo,H.

SPIE - The International Society for Optical Engineering
12 国際会議録 Large-aperture x-ray refractive lens from lithium

Pereira, N.R., Dufresne, E.M., Arms, D.A., Clarke, R.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12