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Effect of TiN treated by rapid thermal annealing on properties of BST capacitors prepared by RF magnetron Co-sputter system at low substrate temperature

著者名:
Teng, T. H.
Hwang, C. C.
Lai, M. J.
Huang, S. C.
Chen, J. S.
Jaing, C. C.
Cheng, H. C.
さらに 2 件
掲載資料名:
Ferroelectric thin films VIII : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
596
発行年:
2000
開始ページ:
37
出版情報:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995048 [1558995048]
言語:
英語
請求記号:
M23500/596
資料種別:
国際会議録

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