A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using Source/Drain and Silicide Process Modules and Their Interactions
- 著者名:
Vasanth, K. Apte, P. Davis, J. Saxena, S. Burch, R. Rao, S. Mozumder, P. K. - 掲載資料名:
- Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 525
- 発行年:
- 1998
- 開始ページ:
- 325
- 出版情報:
- Pittsburgh, PA: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994317 [1558994319]
- 言語:
- 英語
- 請求記号:
- M23500/525
- 資料種別:
- 国際会議録
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