Comparison of the Performance of Single Wafer and Batch Systems for Identical Processes

Comparison of the Performance of Single Wafer and Batch Systems for Identical Processes

著者名:

掲載資料名:

Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

525

発行年:

1998

開始ページ:

3

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994317 [1558994319]

言語:

英語

請求記号:

M23500/525

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019382
シリーズID:	PA00000011
会議名:	Symposium on rapid thermal and integrated processing
回次:	7th
会議開催地:	San Francisco, CA, USA
会議開催年:	1998.04.13-1998.04.14

類似資料:

1 国際会議録 The Process of Innovation in Batch Fumaces Hasper, A., Claasen-Vujcic, T., Noben, R. Electrochemical Society	7 国際会議録 Effective Polymer and Etch Residue Removal Using Single-Wafer Processing Peters, D., Egbe, M., Ravito, R., Rieker, J., Fiener, S., Tea, T., Seong, T.-K., Nguyen, L.V., Henry, S-A., Gaulhofer, … Electrochemical Society
2 国際会議録 Comparison of Polysilicon Etch Processes Using Single Wafer and Batch Reactors Mautz, K., Alzaben, T. Electrochemical Society	8 国際会議録 Understanding the Impact of Batch versus Single Wafer in Thermal Processing Using Cost of Ownership Analysis Hossain-Pas, S., Pas, M. F. MRS - Materials Research Society
3 国際会議録 29 Batch Atomic Layer Deposition for MIM capacitors de Blank, R., Snijders, G.J., Beulens, S., Vandezande, L., Wilhelm, R., Hasper, A. Electrochemical Society	9 国際会議録 A comparison of two identical SAW devices J. T. Sanders Society of Photo-optical Instrumentation Engineers
4 国際会議録 COMPARISON BETWEEN l/f NOISE, HIGH-RESOLUTION RESISTOMETRIC, AND LIFETIME ELECTROMIGRATION STUDIES OF Al AND Al(Si) Kraayeveld, J. R., Verbruggen, A. H., Radelaar, S. MRS - Materials Research Society	10 国際会議録 ESTIMATING LOCAL DEPOSITION CONDITIONS AND KINETIC PARAMETERS USING FILM PROFILE Cale, T. S., Chara, M. B., Hasper, A. Materials Research Society
5 国際会議録 Batch-dissolved wafer process for low-cost sensor applications Cho,S.T. SPIE-The International Society for Optical Engineering	11 国際会議録 EVALUATION OF NEW MEGASONIC SYSTEM FOR SINGLE WAFER CLEANING Takeuchi, K., Tomozawa, A., Onishi, A., Tanzawa, A., Azuma, T., Umemura, S.-I., Wu, Y., Bran, M., Fraser, B. Electrochemical Society
6 国際会議録 Flexible Batch Processing Control System PHILLIPS, S.G., BROWNLIE, T. American Institute of Chemical Engineers	12 国際会議録 Optimization of Single Wafer and Batch Metal Etch Manufacturing Processes Mautz, K.E. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12