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Novel x-ray mask structure with low out-of-plane distortion

著者名:
  • Jeon,Y.J. ( Electronics and Telecommunications Research Institute (Korea) )
  • Choi,S.-S. ( Electronics and Telecommunications Research Institute (Korea) )
  • Kim,I.Y. ( Korea Advanced Institute of Science and Technology )
  • Chung,H.B. ( Electronics and Telecommunications Research Institute (Korea) )
  • Kim,B.W. ( Electronics and Telecommunications Research Institute (Korea) )
掲載資料名:
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3331
発行年:
1998
開始ページ:
511
終了ページ:
517
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427762 [0819427764]
言語:
英語
請求記号:
P63600/3331
資料種別:
国際会議録

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