Blank Cover Image

Development of SiO2/c-Si bilayer e-beam resist process and its application for 10-nm-scale MIM junctions

著者名:
Gorwadkar,S. ( Electrotechnical Lab. (Japan) and New Energy and Industrial Technology Development Organization (Japan) )
Wada,T. ( Electrotechnical Lab. (Japan) )
Shirakashi,J. ( Electrotechnical Lab. (Japan) )
Hiroshima,H. ( Electrotechnical Lab. (Japan) )
Ishii,K. ( Electrotechnical Lab. (Japan) )
Komuro,M. ( Electrotechnical Lab. (Japan) )
さらに 1 件
掲載資料名:
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3331
発行年:
1998
開始ページ:
359
終了ページ:
368
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427762 [0819427764]
言語:
英語
請求記号:
P63600/3331
資料種別:
国際会議録

類似資料:

1 国際会議録 Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)

Gorwadkar, S., Itatani, T., Komuro, M., Shiotani, A., Itatani, H.

SPIE - The International Society of Optical Engineering
7 国際会議録 Development of 193-nm organic BARC

Kishioka,T., Arase,S., Ishii,K., Mizusawa,K., Fukuro,H.

SPIE-The International Society for Optical Engineering
2 国際会議録 Highly Suppressed Threshold Voltage Roll-off Characteristics of the 4 nm-Thick SOI n- MOSFETs in the 40-135 nm Gate Length Regime

Suzuki, E, Ishii, K, Kanemaru, S, Maeda, T, Tautaumi, T, Nagai, K, Sekigawa, T, Hiroshima, H

Electrochemical Society
8 国際会議録 DOUBLE BEAM PHOTOCONDUCTIVITY MODULATION SYSTEM AND ITS APPLICATION TO THE CHARACTERIZATION OF A PROCESS OF PHOTORESIST REMOVAL

Usami, A., Fujiwara, H., Nakai, T., Matsuki, K., Takeuchi, T., Wada, T.

Materials Research Society
3 国際会議録 *Nanoscale electron-beam processes and its application to nanodevices

Komuro, Masanori

MRS-Materials Research Society
9 国際会議録 193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Gorwadkar, S., Itatani, T., Itatani, H.

SPIE - The International Society of Optical Engineering
4 国際会議録 Magnetic Abrasive Finishing Using Nano-size Diamond Dispersed Co-Ni Electroless Plated Plastic Balls and its Application to Post CMP Process

S. Yoshihara, K. Hanzawa, T. Shirakashi

Electrochemical Society
10 国際会議録 Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

Itatani,T., Gorwadkar,S., Fukushima,T., Komuro,M., Itatani,H., Tomoi,M., Sakamoto,T., Matsumoto,S.

SPIE - The International Society for Optical Engineering
5 国際会議録 Improvement of resist profile roughness in bilayer resist process

Jeong,C.-Y., Ryu,S., Park,K.-Y., Lee,W.G., Lee,S.-W., Lee,D.-H.

SPIE - The International Society for Optical Engineering
11 国際会議録 Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists

Itatani, T., Gorwadkar, S., Shiotani, A., Igusa, M., Yonei, K., Maeda, J., Itotani, H.

SPIE - The International Society of Optical Engineering
6 国際会議録 ELECTRON BEAM INDUCED DEGRADATION OF 2DEG IN AlGaAs/GaAs HETEROSTRUCTURE

Wada, T., Kanayama, T., Ichimura, S., Sugiyama, Y., Komuro, M.

MRS - Materials Research Society
12 国際会議録 Application of a bilayer silylated resist process in volume production

Franzen,R., Grassmann,A., Kirschinger,M., Schedel,T., Wiedenhofer,H., Witte,M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12