Large-area high-throughput high-resolution lithography systems for flat-panel displays and microelectronic modules (Invited Paper)

Large-area high-throughput high-resolution lithography systems for flat-panel displays and microelectronic modules (Invited Paper)

著者名:

Jain,K. ( Anvik Corp. )
Dunn,T.J. ( Anvik Corp. )
Farmiga,N. ( Anvik Corp. )
Zemel,M. ( Anvik Corp. )
Weisbecker,C. ( Anvik Corp. )

掲載資料名:

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3331

発行年:

1998

開始ページ:

197

終了ページ:

206

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427762 [0819427764]

言語:

英語

請求記号:

P63600/3331

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019241
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	1998 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

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