Smooth and anisotropic ion beam etching of InP with Ar/H2 chemistry

Smooth and anisotropic ion beam etching of InP with Ar/H2 chemistry

著者名:

Cakmak,B. ( Univ.of Bristol )
Yu,S.
Penty,R.V.
White,I.H.

掲載資料名:

Integrated optics devices iv : 24-25 January, 2000, San Jose, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3936

発行年:

2000

開始ページ:

139

終了ページ:

146

出版情報:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819435538 [0819435538]

言語:

英語

請求記号:

P63600/3936

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019026
シリーズID:	PA00000029
会議名:	Photonics West - Optoelectronic Materials and Devices : Integrated optics devices
回次:	2000 : 4th
会議開催地:	San Jose, CA, USA
会議開催年:	2000.01.24-2000.01.25

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