Intrawafer CD control in state-of-the-art lithography

Intrawafer CD control in state-of-the-art lithography

著者名:

Pollentier,I.K. ( IMEC )

掲載資料名:

Optical microlithography XII : 17-19 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3679

発行年:

1999

巻:

Part2

開始ページ:

882

終了ページ:

892

出版情報:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431530 [0819431532]

言語:

英語

請求記号:

P63600/3679

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019002
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	1999 : 12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.17-1999.03.19

類似資料:

1 国際会議録 Role of LV-SEM reticle CD measurements on DUV lithography Thomas Marschner, Ivan K. Pollentier, Goedele Potoms, Rik M. Jonckheere, Kurt G. Ronse SPIE - The International Society of Optical Engineering	7 国際会議録 Lithography aspects of dual-damascene interconnect technology Maenhoudt,M., Goidsenhoven,D.Van, Pollentier,I.K., Ronse,K., Lepage,M., Struyf,H., Hove,M.Van SPIE-The International Society for Optical Engineering
2 国際会議録 CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques Vandenberghe,G., Marschner,T., Ronse,K., Socha,R.J., Dusa,M.V. SPIE - The International Society for Optical Engineering	8 国際会議録 Resist reflow for 193-nm low-K1 lithography contacts Montgomery, P.K., Lucas, K., Strozewski, K.J., Zavyalova, L., Grozev, G., Reybrouck, M., Tzviatkov, P., Maenhoudt, M. SPIE-The International Society for Optical Engineering
3 国際会議録 Front-end-of-line process development using 193-nm lithography Pollentier,I.K., Ercken,M., Eliat,A., Delvaux,C., Jaenen,P., Ronse,K. SPIE-The International Society for Optical Engineering	9 国際会議録 High-power sources for EUV lithography: state of the art Stamm, U., Kleinschmidt, J., Gaebel, K.M., Birner, H., Ahmad, I., Bolshukhin, D., Brudermann, J., Chinh, T.D., Flohrer, … SPIE - The International Society of Optical Engineering
4 国際会議録 CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ｦﾌm gate printing Ronse,K., Maenhoudt,M., Marschner,T., Van,den,hove,L., Streefkerk,B., Finders,J., van,Schoot,J., Luehrmann,P.F., … SPIE-The International Society for Optical Engineering	10 国際会議録 AttPSM CD control: mask bias and flare effects Kim. Y.-C., Vandenberghe, G., Ronse, K. SPIE-The International Society for Optical Engineering
5 国際会議録 Status of ArF lithography for the 130-nm technology node Ronse,K., Vandenberghe,G., Jaenen,P., Delvaux,C., Vangoidsenhoven,D., Roey,F.Van, Pollers,I., Maenhoudt,M., … SPIE - The International Society for Optical Engineering	11 国際会議録 Line-edge roughness reduction and CD slimming using hardback processing Peters, R.D., Lucas, K., Cobb, J.L., Parker, C., Patterson, K., McCauley, R., Ercken, M., Roey, F.V., Vandenbroeck, N., … SPIE-The International Society for Optical Engineering
6 国際会議録 Variable-threshold resist models for lithography simulation Randall,J., Ronse,K., Marschner,T., Goethals,M., Ercken,M. SPIE - The International Society for Optical Engineering	12 国際会議録 Characterization of 193-nm resist layers by CD-SEM sidewall imaging Marschner, T., Stief, C. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12