Illumination condition and mask bias for 0.15-ヲフm pattern with KrF and ArF lithography
- 著者名:
- Tabuchi,H. ( SHARP Corp. )
- Shichijo,Y.
- Oka,N.
- Takenaka,N.
- lguchi,K.
- 掲載資料名:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3679
- 発行年:
- 1999
- 巻:
- Part2
- 開始ページ:
- 860
- 終了ページ:
- 871
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- 言語:
- 英語
- 請求記号:
- P63600/3679
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Proposal of a composite phase-shifting mask for 0.15-ヲフm hole-pattern delineation using KrF exposure
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |