Lithographic implications for Cu/low-k integration
- 著者名:
- Mih,R.D. ( IBM Microelectronics Div. )
- Chen,N.
- Jantzen,K.R.
- Marsh,J.T.
- Schneider,S.
- 掲載資料名:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3679
- 発行年:
- 1999
- 巻:
- Part2
- 開始ページ:
- 827
- 終了ページ:
- 838
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- 言語:
- 英語
- 請求記号:
- P63600/3679
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
American Institute of Chemical Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
ESA Publications Division |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |