Optimizing of thin-film interference effects in KrF lithography for 0.15-ｦﾌm design rules

Optimizing of thin-film interference effects in KrF lithography for 0.15-ｦﾌm design rules

著者名:

Oh,S.-C. ( Hyundai MicroElectronics Industries Co.,Ltd. )
Kim,Y.-C.
Nah,S.-H.
Huh,H.
Han,S.-B.

掲載資料名:

Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3999

発行年:

2000

巻:

Part2

開始ページ:

926

終了ページ:

934

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436177 [0819436178]

言語:

英語

請求記号:

P63600/3999

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018975
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2000 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.01

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2 国際会議録 Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography Kim,S.-K., Kim,Y.-S., Kim,J.-S., Bok,C.-K., Ham,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering	8 国際会議録 ArF step-and-scan exposure system for 0.15-ｦﾌm and 0.13-ｦﾌm technology nodes Mulkens,J., Stoeldraijer,J.M., Davies,G., Dierichs,M., Heskamp,B., Moers,M.H., George,R.A., Roempp,O., Glatzel,H., … SPIE - The International Society for Optical Engineering
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6 国際会議録 Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography Hsia,C.-C., Gau,T.-S., Yang,C.-H., Liu,R.-C., Chang,C.-H., Chen,L.-J., Wang,C.-M., Chen,J.F., Smith,B.W., Hwang,G.-W., … SPIE - The International Society for Optical Engineering	12 国際会議録 Manufacturing optimization strategies for 0.35-ｦﾌm design rules Tyminski,J.K., McNamara,S.J., Sasaya,T., Komatsu,M., Humphrey,D.C., Winslow,A. SPIE-The International Society for Optical Engineering

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