HIGH RESOLUTION PHOTOELECTRON STUDY OF THE OPTIMUM OXYGEN DOPING LEVELS IN HIGH Tc SUPERCONDUCTORS
- 著者名:
- 掲載資料名:
- Applications of synchrotron radiation techniques to materials science : symposium held April 12-15, 1993, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 307
- 発行年:
- 1993
- 開始ページ:
- 193
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992030 [1558992030]
- 言語:
- 英語
- 請求記号:
- M23500/307
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
3
国際会議録
High Resolution Neutron Diffraction Studies of the Flux-Line Lattice in Borocarbide Superconductors
Kluwer Academic Publishers |
ESA Publications Division |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Plenum Press |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
国際会議録
Analysis of the resolution doubling technique of high-resolution gratings by x-ray lithography
Society of Photo-optical Instrumentation Engineers |