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Effects of CF4 Reactive Ion Etching on Si-Doped Al0.2Ga0.8As

著者名:
掲載資料名:
III-V and IV-IV materials and processing challenges for highly integrated microelectronics and optoelectronics : symposium held November 30-December 3, 1998, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
535
発行年:
1999
開始ページ:
243
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994416 [1558994416]
言語:
英語
請求記号:
M23500/535
資料種別:
国際会議録

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