Etching of Platinum Thin Films by High Density Ar/Cl2/HBr Plasma

Etching of Platinum Thin Films by High Density Ar/Cl2/HBr Plasma

著者名:

Kim, C-I.

掲載資料名:

Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

514

発行年:

1998

開始ページ:

357

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994201 [1558994203]

言語:

英語

請求記号:

M23500/514

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018917
シリーズID:	PA00000011
会議名:	Symposium on advanced interconnects and contact materials and processes for future integrated circuits
回次:	1998
会議開催地:	San Francisco, CA, USA
会議開催年:	1998.04.13-1998.04.16

類似資料:

1 国際会議録 Corrosion Phenomena on the Grain Boundary of AlCu Films After Plasma Etching Kim, C. I., Kwon, K. H., Yun, S. J., Kim, H. J., Chang, E. G. MRS - Materials Research Society	7 国際会議録 Dry etching technology of Cr and MoSi layers using high-density plasma source Kwon,H.-J., Oh,K.-S., Chang,B.-S., Choi,B.-Y., Park,K.-H., Jeong,S.-H. SPIE-The International Society for Optical Engineering
2 国際会議録 Etch Characteristics of GaN Using Inductively-Coupled Cl2/HBr and Cl2/Ar Plasmas Kim, H. S., Lee, Y. J., Lee, Y. H., Lee, J. W., Yoo, M. C., Kim, T. I., Yeom, G. Y. MRS - Materials Research Society	8 国際会議録 Hydrogen Induced Polarization Degradation of SrBi2Ta2O9 Thin Film Capacitors in Plasma Etching Kwon, O-S., Seal, Y-S., Kim, J-W., Hwang, J-M. Electrochemical Society
3 国際会議録 Production of High Density Plasma on the Substrate in a Helicon Source and application to the Deposition of SiOF Film with Low Dielectric Constant Kim, J-H., Seo, S-H., Yun, S-M., Chang, H-Y., Choi, C-K., Lee, K-M. Electrochemical Society	9 国際会議録 Crystallization and Wet Etching Characteristics of Atomic Layer Deposited HfO₂ Films Using Hf[N(CH₃)(C₂H₅)]₃[OC(CH₃)₃]) Precursor and O₃ Oxidant M. Seo, S. Kim, K. Kim, T. Park, J. Kim, C. Hwang, H. Cho Electrochemical Society
4 国際会議録 Inductively Coupled Plasma Etching of Pb(ZrxTil-x)O3 Thin Films In Cl2C2F6 and HBr Plasmas Chung, C.W., Byun, Y.H., Kim, H.I. Electrochemical Society	10 国際会議録 The Etching Properties Of SrBi2Ta2O9 Thin Films In CF4/Ar Inductively Coupled Plasma Kim, Dong-Pyo, Kim, Chang-Il Electrochemical Society
5 国際会議録 Ferroelectric Properties of Lead-Free (Bi,La)4Ti3O12 Thin Film Deposited on MTP Cell Structure for High Density FeRAM Device Cho, K. W., Kim, N. K., Oh, S. H., Choi, E. S., Sun, H. J., Yeom, S. J., Lee, K. N., Lee, S. S., Hong, S. K., Choi, S. … Trans Tech Publications	11 国際会議録 EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING Park, H.-H., Kwon, K.-H., Lee, S.-H., Nahm, S., Lee, J.-W., Koak, B.-H., Suh, K.-S., Kwon, O.-J., Lee, J.-L., Yeom, … MRS - Materials Research Society
6 国際会議録 Grain Size and Orientation Control in Lead-Free (Bi,La)4Ti3O12 Thin Film Deposited by Spin-On Method for High Density FeRAM Device Y.M. Kim, G.E. Jang, N.K. Kim, S.J. Yeom, S.Y. Kweon Trans Tech Publications	12 国際会議録 Dry Etching of PZT Films With CF4/Ar High Density Plasma Park, C., Cho, J. H., Choi, C. J., Seol, Y. S., Choi, I. H. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12