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Optimization of Ti and Co Self-Aligned Silicide RTP for 0.10 ヲフm CMOS

著者名:
Kittl, J. A.
Hong, Q. Z.
Yang, H.
Yu, N.
Rodder, M.
Apte, P. P.
Shiau, W. T.
Chao, C. P.
Breedijk, T.
Pas, M. F.
さらに 5 件
掲載資料名:
Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
514
発行年:
1998
開始ページ:
255
出版情報:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994201 [1558994203]
言語:
英語
請求記号:
M23500/514
資料種別:
国際会議録

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