Optimization of Ti and Co Self-Aligned Silicide RTP for 0.10 ヲフm CMOS
- 著者名:
Kittl, J. A. Hong, Q. Z. Yang, H. Yu, N. Rodder, M. Apte, P. P. Shiau, W. T. Chao, C. P. Breedijk, T. Pas, M. F. - 掲載資料名:
- Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 514
- 発行年:
- 1998
- 開始ページ:
- 255
- 出版情報:
- Warrendale, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994201 [1558994203]
- 言語:
- 英語
- 請求記号:
- M23500/514
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
10
国際会議録
Tuned MEDICI simulator including inverse short channel effect for sub-0.18-ヲフm CMOS technologies
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
11
国際会議録
Optimum junction depth design of the S/D extension regions (MDD) for sub-0.18-ヲフm CMOS technologies
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |