C49-TiSi2 Epitaxial Orientation Dependence of the C49-to-C54 Phase Transformation Rate

C49-TiSi2 Epitaxial Orientation Dependence of the C49-to-C54 Phase Transformation Rate

著者名:

掲載資料名:

Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

514

発行年:

1998

開始ページ:

213

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994201 [1558994203]

言語:

英語

請求記号:

M23500/514

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018917
シリーズID:	PA00000011
会議名:	Symposium on advanced interconnects and contact materials and processes for future integrated circuits
回次:	1998
会議開催地:	San Francisco, CA, USA
会議開催年:	1998.04.13-1998.04.16

類似資料:

1 国際会議録 Structure, Morphology, and Kinetics of the C49 to C54 Phase Transformation in TiSi2 Thin Films Bocelli, S., Marabelli, F., Iannuzzi, M., Miglio, L., Grimaldi, M. G., LaVia, F. MRS - Materials Research Society	7 国際会議録 Direct Formation of C54 Phase on the Basis of C40 TiSi2 and Its Applications in Deep Sub-Micron Technology Chen, S.Y., Shen, Z.X., Xu, S.Y., See, A.K., Chan, L.H., Li, W.S. Materials Research Society
2 国際会議録 Kinetics of the C49 to C54 Phase Transformation in TiSi2 Thin Films on Deep-Sub-Micron Lines Kittl, J. A., Prinslow, D. A., Apte, P. P., Pas, M. F. MRS - Materials Research Society	8 国際会議録 THICKNESS DEPENDENCE OF EPITAXIAL TiSi2 ON Si(111) Jeon, Hyeongtag, Honeycutt, J.W., Sukow, C.A., Rozgonyi, G.A., Nemanich, R.J. Materials Research Society
3 国際会議録 In Situ TEM Analysis of TiSi2 C49-C54 Transformations During Annealing Gignac, L. M., Svilan, V., Clevenger, L. A., Cabral, C., Jr., Lavoie, C. MRS - Materials Research Society	9 国際会議録 COMPARATIVE STUDY OF INTERFACE STRUCTURE IN GaAs/AlAs SUPERLATTICES BY TEM AND RAMAN SCATTERING Nakamura, T., Ikeda, M., Muto, S., Komiya, S., Umebu, I. Materials Research Society
4 国際会議録 Kinetics of the C49-C54 Transformation in Patterned and Blanket TiSi2 Films: A Comparison Via, F. La, Privitera, S., Grimaldi, M. G., Raineri, V., Galli, M., Marabelli, F., Iannuzzi, M., Miglio, L. MRS - Materials Research Society	10 国際会議録 Dependence of Crystallographic Texture of C54 TiSi2 on Thickness and Linewidth in Submicron CMOS Structures Svilan, V., Rodbell, K. P., Clevenger, L. A., Cabral, C., Jr., Roy, R. A., Lavoie, C., Jordan-Sweet, J., Harper, J. M. … MRS - Materials Research Society
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