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Diffusion Barrier Reliability With Respect to the Role of TiN Stoichiometry Between Al Metallization and Si Substrate

著者名:
掲載資料名:
Thin films - structure and morphology : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
441
発行年:
1997
開始ページ:
323
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993457 [1558993452]
言語:
英語
請求記号:
M23500/441
資料種別:
国際会議録

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