Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source
- 著者名:
Constantine, C. Johnson, D. Barratt, C. Shul, R. J. McClellan, G. B. Briggs, R. D. Rieger, D. J. Karlicek, R. F., Jr. Lee, J. W. Pearton, S. J. - 掲載資料名:
- Compound semiconductor electronics and photonics : symposium held April 8-10, 1996, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 421
- 発行年:
- 1996
- 開始ページ:
- 431
- 出版情報:
- Pittsburgh, Penn: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993242 [155899324X]
- 言語:
- 英語
- 請求記号:
- M23500/421
- 資料種別:
- 国際会議録
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