Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source | 東京工業大学附属図書館文献データベース

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Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source

著者名:

Constantine, C.

McClellan, G. B.

Karlicek, R. F., Jr.

さらに 5 件

掲載資料名:

Compound semiconductor electronics and photonics : symposium held April 8-10, 1996, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

421

発行年:

1996

開始ページ:

431

出版情報:

Pittsburgh, Penn: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993242 [155899324X]

言語:

英語

請求記号:

M23500/421

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018908
シリーズID:	PA00000011
会議名:	Symposium on compound semiconductor electronics and photonics
回次:	1996
会議開催地:	San Francisco, CA, USA
会議開催年:	1996.04.08-1996.04.10

類似資料:

1 国際会議録 ECR, ICP and RIE plasma etching of GaN Shul, R.J., McClellan, G.B., Rieger, D.J., Hafich, M.J., Drummond, T.J., Pearton, S.J., Abernathy, C.R., Constantine, … Electrochemical Society	7 国際会議録 Cl2-Based Dry Etching of the AlGalnN System in Inductively-Coupled Plasmas Cho, Hyun, Vartuli, C. B., Abernathy, C. R., Donovan, S. M., Pearton, S. J., Shul, R. J., Han, J. MRS - Materials Research Society
2 国際会議録 Chlorine-Based Plasma Etching of GaN Shul, R. J., Briggs, R. D., Pearton, S. J., Vartuli, C. B., Abernathy, C. R., Lee, J. W., Constantine, C., Barratt, C. MRS - Materials Research Society	8 国際会議録 Inductively Coupled Plasma Etching of III-Nitrides in Cl2/Xe, Cl2/Ar and Cl2/He Cho, H., Hahn, Y. B., Hays, D. C., Jung, K. B., Donovan, S. M., Abernathy, C. R., Pearton, S. J., Shul, R. J. MRS - Materials Research Society
3 国際会議録 Plasma-Induced-Damage of GaN Shul, R.J., Zolper, J.C., Hagerott Crawford, M., Hickamn, R.J., Briggs, R.D., Pearton, S.J., Lee, J.W., Karlicek, R.F., … Electrochemical Society	9 国際会議録 Plasma etching of Cr photomasks:parametric comparisons of plasma sources and process conditions Constantine,C., Johnson,D.J., Westerman,R.J., Coleman,T.P., Faure,T. SPIE-The International Society for Optical Engineering
4 国際会議録 Inductively-Coupled Plasma Etching of NiFe and NiFeCo Jung, K. B., Childress, J. R., Pearton, S. J., Jenson, M., Hurst, A. T., Jr., Johnson, D. MRS - Materials Research Society	10 国際会議録 Inductively coupled plasma etch of DUV MoSi photomasks:a designed study of etch chemistries and process results Constantine,C., Johnson,D.J., Westerman,R.J., Hourd,A.C. SPIE - The International Society for Optical Engineering
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6 国際会議録 ICP Dry Etching of III-V Nitrides Vartuli, C. B., Lee, J. W., MacKenzie, J. D., Donovan, S. M., Abernathy, C. R., Pearton, S. J., Shul, R. J., … MRS - Materials Research Society	12 国際会議録 Dry etching for the fabrication of flat panel displays C. Barratt, D.J. Johnson, C. Constantine Society of Photo-optical Instrumentation Engineers

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