Dry Etching of InGaP and AlInP in CH4/H2/Ar

Dry Etching of InGaP and AlInP in CH4/H2/Ar

著者名:

Lee, J. W.

掲載資料名:

Compound semiconductor electronics and photonics : symposium held April 8-10, 1996, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

421

発行年:

1996

開始ページ:

315

出版情報:

Pittsburgh, Penn: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993242 [155899324X]

言語:

英語

請求記号:

M23500/421

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018908
シリーズID:	PA00000011
会議名:	Symposium on compound semiconductor electronics and photonics
回次:	1996
会議開催地:	San Francisco, CA, USA
会議開催年:	1996.04.08-1996.04.10

類似資料:

1 国際会議録 Cl2-Based ECR Etching of InGaP, AlInP and AlGaP Hong, J., Lee, J. W., Pearton, S. J., Santana, C., Abernathy, C. R., Hobson, W. S., Ren, F. MRS - Materials Research Society	7 国際会議録 Patterning of LiGaO2 and LiAlO2 by Wet and Dry Etching Lee, J. W., Pearton, S. J., Abernathy, C. R., Wilson, R. G., Chai, B. L., Ren, F., Zavada, J. M. MRS - Materials Research Society
2 国際会議録 High Microwave Power ECR Etching of III-V Semiconductors in CH4/H2/Ar Lee, J.W., Pearton, S.J., Lambers, E.S., Mileham, J.R., Abernathy, C.R., Hobson, W.S., Ren, F., Shul, R.J. Electrochemical Society	8 国際会議録 Investigation of Wet Chemical Etching of InGaAlP Alloys Lee, J.W., Santana, C.J., Abernathy, C.R., Pearton, S.J., Ren, F., Hobson, W.S., Lothian, J.R., Wu, C.S. Electrochemical Society
3 国際会議録 Wet and Dry Etch Selectivity For the GaAs/AlGaAs and GaAs/InGaP Systems Hays, D., Abernathy, C.R., Pearton, S.J., Ren, F., Hobson, W.S. Electrochemical Society	9 国際会議録 WET AND DRY ETCHING OF InGaP Lothian, J. R., Kuo, J. M., Pearton, S. J., Ren, F. Materials Research Society
4 国際会議録 Selective dry etching of the GaN/InN/AlN, GaAs/AlGaAs and GaAs/InGaP systems Hays, D.C., Abernathy, C.R., Hobson, W.S., Pearton, S.J., Han, J., Shul, R.J., Cho, H., Jung, K.B., Ren, F., Hahn, Y.B. Materials Research Society	10 国際会議録 Development of GaN and InGaN Gratings by Dry Etching Lee, J. W., Hong, J., MacKenzie, J. D., Abernathy, C. R., Pearton, S. J., Ren, F., Sciortino, P. F., Jr. MRS - Materials Research Society
5 国際会議録 REDUCTION OF SIDEWALL ROUGHNESS DURING DRY ETCHING OF SiO2 Ren, F., Pearton, S.J., Lothian, J.R., Abernathy, C.R., Hobson, W.S. Materials Research Society	11 国際会議録 HI/H2 ECR PLASMA ETCHING OF III-V SEMICONDUCTORS Pearton, S. J., Chakrabarti, U. K., Katz, A., Ren, F., Fullowan, T. R., Abernathy, C R., Hobson, W. S. Materials Research Society
6 国際会議録 Damage Introduction in InGaP and AlGaAs by Electron Cyclotron Resonance Ar Plasmas Lee, J. W., Pearton, S. J., Stradtmann, R. R., Abernathy, C. R., Hobson, W. S., Ren, F. MRS - Materials Research Society	12 国際会議録 NEW DRY-ETCH CHEMISTRIES FOR III-V SEMICONDUCTORS Pearton, S. J., Chakrabarti, U. K., Ren, F., Abernathy, C. R., Katz, A., Hobson, W. S., Constantine, C. MRS - Materials Research Society

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