Blank Cover Image

DRY ETCHING OF Ta-Si-N DIFFUSION BARRIER MATERIAL IN CF4+O2 GAS MIXTURES

著者名:
掲載資料名:
Advanced metallization for devices and circuits--science, technology, and manufacturability : symposium held April 4-8, 1994, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
337
発行年:
1994
開始ページ:
669
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992375 [1558992375]
言語:
英語
請求記号:
M23500/337
資料種別:
国際会議録

類似資料:

1 国際会議録 AMORPHOUS W-Zr FILMS AS DIFFUSION BARRIERS BETWEEN Al AND Si

So, F.C.T., Zhao, X.-A., Kolawa, E., Tandon, J.L., Zhu, M.F., Nicolet, M.-A.

Materials Research Society
7 国際会議録 Plasma Chemistries for Dry Etching GaN, AlN, InGaN and InAlN

Pearton, S. J., Vartuli, C. B., Lee, J. W., Donovan, S. M., MacKenzie, J. D., Abernathy, C. R., Shul, R. J., McLane, G. …

MRS - Materials Research Society
2 国際会議録 Ta-Si-N AND Si3N4 ENCAPSULANTS FOR InP

Reid, J. S., Ruiz, R. P., Kolawa, E., Chen, J. S., Madok, J., Nicolet, M.-A

Materials Research Society
8 国際会議録 Dry Etching of SiC for Advanced Device Applications

Flemish, J. R., Xie, K., McLane, G. F.

MRS - Materials Research Society
3 国際会議録 Dry Etching of III-V Nitrides

Pearton, S. J., Shul, R. J., McLane, G. F., Constantine, C.

MRS - Materials Research Society
9 国際会議録 CHEMICAL STABILITY OF VB2 AND ZrB2 WITH ALUMINUM

Halperin, L. E., Kolawa, E., Fu, Z., Nicolet, M.-A.

Materials Research Society
4 国際会議録 STABLE SOLID-PHASE OHMIC CONTACTS TO n-GaAs DIFFUSION BARRIERS

Kolawa, E., Nieh, C.W., Flick, W., Molarious, J., Nicolet, M-A., Tandon, J.L., Madok, J.H.

Materials Research Society
10 国際会議録 DRY ETCH INDUCED DEFECTS OF GaAs SURFACES PRODUCED BY CH4/H2/Ar PLASMAS

McLane, G. F., Buchwald, W. R.

MRS - Materials Research Society
5 国際会議録 Copper Metallization Layers on Bismuth-Telluride Substrates: Effectiveness of Cr, Pt, and Ta40Si14N46 Thin Films As Diffusion Barriers

Kacsich, T., Nicolet, M-A., Kolawa, E., Fleurial, J-P.

MRS - Materials Research Society
11 国際会議録 Patterning of LiGaO2 and LiAlO2 by Wet and Dry Etching

Lee, J. W., Pearton, S. J., Abernathy, C. R., Wilson, R. G., Chai, B. L., Ren, F., Zavada, J. M.

MRS - Materials Research Society
6 国際会議録 Stable Pt/Ge/Au ohmic contact to n-GaAs with a Ta-Si-N barrier

Chen, J. S., Kolawa, E., Ruiz, R. P., Nicolet, M-A.

MRS - Materials Research Society
12 国際会議録 THIN-FILM ENCAPSULANTS FOR THERMAL PROCESSING OF GaAs

Molarius, J. M., Kolawa, E., Morishita, K., Pan, E. T.-S, Tandon, J. L., Nicolet, M-A.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12