Fabrication of fused silica phase masks by reactive ion etching

Fabrication of fused silica phase masks by reactive ion etching

著者名:

Chen,G. ( Northern Jiaotong Univ. )

掲載資料名:

Holographic Optical Elements and Displays

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2885

発行年:

1996

開始ページ:

164

終了ページ:

168

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422866 [081942286X]

言語:

英語

請求記号:

P63600/2885

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018884
シリーズID:	PA00000029
会議名:	Photonics China : Holographic Optical Elements and Displays
回次:	1996
会議開催地:	Beijing, China
会議開催年:	1996.11.04-1996.11.05

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