Materials and processing issues in the development of N2O/NO-based ultrathin oxynitride gate dielectrics for CMOS ULSI applications
- 著者名:
- Kim,B.Y. ( Univ.of Texas/Austin )
- Wristers,D.
- Kwong,D.L.
- 掲載資料名:
- Microelectronic Device and Multilevel Interconnection Technology II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2875
- 発行年:
- 1996
- 開始ページ:
- 188
- 終了ページ:
- 200
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422736 [0819422738]
- 言語:
- 英語
- 請求記号:
- P63600/2875
- 資料種別:
- 国際会議録
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