High-performance metal-gate SOI CMOS fabricated by ultraclean low-temperature process technologies
- 著者名:
- Ushiki,T. ( Tohoku Univ. )
- Hirano,Y.
- Shimada,H.
- Ohmi,T.
- 掲載資料名:
- Microelectronic Device and Multilevel Interconnection Technology II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2875
- 発行年:
- 1996
- 開始ページ:
- 28
- 終了ページ:
- 38
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819422736 [0819422738]
- 言語:
- 英語
- 請求記号:
- P63600/2875
- 資料種別:
- 国際会議録
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