Mix-and-match lithography processes for 0.1-ｦﾌm MOS transistor device fabrication

Mix-and-match lithography processes for 0.1-ｦﾌm MOS transistor device fabrication

著者名:

Yew,J.-Y. ( National Tsing Hua Univ. )
Chen,L.-J.
Nakamura,K.
Chao,T.-S.
Lin,H.-C.

掲載資料名:

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2723

発行年:

1996

開始ページ:

180

終了ページ:

188

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420992 [0819420999]

言語:

英語

請求記号:

P63600/2723

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018868
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing
回次:	1996 : 6th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.11-1996.06.13

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