Characterization of the alignment system on a laboratory extreme ultraviolet lithography tool | 東京工業大学附属図書館文献データベース

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Characterization of the alignment system on a laboratory extreme ultraviolet lithography tool

著者名:

Nguyen,K.B. ( Sandia National Labs. )

Ray-Chaudhuri,A.K.

さらに 8 件

掲載資料名:

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2723

発行年:

1996

開始ページ:

54

終了ページ:

62

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420992 [0819420999]

言語:

英語

請求記号:

P63600/2723

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018868
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing
回次:	1996 : 6th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.11-1996.06.13

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1 国際会議録 Printability of substrate and absorber defects on extreme ultraviolet lithographic masks K.B. Nguyen, A.K. Ray-Chaudhuri, D.A. Tichenor, R.H. Stulen, R.P. Nissen Society of Photo-optical Instrumentation Engineers	7 国際会議録 Absolute dosimetry for extreme-ultraviolet lithography Berger,K.W., Campiotti,R.H. SPIE - The International Society for Optical Engineering
2 国際会議録 Development of compact extreme ultraviolet interferometry for on-line testing of lithography cameras A.K. Ray-Chaudhuri, R.P. Nissen, K.D. Krenz, R.H. Stulen Society of Photo-optical Instrumentation Engineers	8 国際会議録 Technical Challenges in Extreme Ultraviolet Lithography Stulen, R.H. Electrochemical Society
3 国際会議録 Recent advances in the Sandia EUV 10x microstepper (Invited Paper) Goldsmith,J.E.M., Wronosky,J.B., Barr,P.K., Berger,K.W., Bernardez II,L.J., Cardinale,G.F., Darnold,J.R., Folk,D.R., … SPIE-The International Society for Optical Engineering	9 国際会議録 Mass-producible microtags for security applications:Tolerance analysis by rigorous coupled-wave analysis Descour,M.R., Sweatt,W.C., Ray-Chaudhuri,A.K., Krenz,K.D., Tichenor,D.A., Stulen,R.H. SPIE-The International Society for Optical Engineering
4 国際会議録 Recent results in the development of an integrated EUVL laboratory tool D.A. Tichenor, G.D. Kubiak, S.J. Haney, R.P. Nissen, K.W. Berger Society of Photo-optical Instrumentation Engineers	10 国際会議録 Initial results from the EUV engineering test stand Tichenor,D.A., Ray-Chaudhuri,A.K., Lee,S.H., Chapman,H.N., Replogle,W.C., Berger,K.W., Stulen,R.H., Kubiak,G.D., … SPIE-The International Society for Optical Engineering
5 国際会議録 Measurement of mid-spatial-frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements Fields,C.H., Ray-Chaudhuri,A.K., Krenz,K.D., Oldham,W.G., Stulen,R.H. SPIE-The International Society for Optical Engineering	11 国際会議録 Mass-producible microholographic tags Sweatt,W.C., Descour,M.R., Ray-Chaudhuri,A.K., Kravitz,S.H., Warren,M.E., Stulen,R.H., Tichenor,D.A., Underwood,J.H., … SPIE-The International Society for Optical Engineering
6 国際会議録 Extreme ultraviolet lithography for circuit fabrication at 0.1-µm feature size D.A. Tichenor, G.D. Kubiak, R.H. Stulen Society of Photo-optical Instrumentation Engineers	12 国際会議録 System integration and performance of the EUV engineering test stand Tichenor,D.A., Ray-Chaudhuri,A.K., Replogle,W.C., Stulen,R.H., Kubiak,G.D., Rockett,P.D., Klebanoff,L.E., … SPIE-The International Society for Optical Engineering

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